ASML is looking to develop computational lithography software to enable customers to achieve the best process window enhancement solution for the next generation HighNA EUV scanner, as well as the best process window control solution to mitigate process variation during scanner operation, providing a holistic solution for advanced nodes in the semi-conductor industry.
Requirements
- Solid understanding of Fourier Optics Imaging and Abbe/Hopkin Imaging Theory
- Knowledge/hands-on experience with Simulation software/technical tools (i.e. Python, Matlab, etc.)
- Experience with rigorous optical simulation is a plus (FDTD, RCWA)
- Knowledge of data analytics and machine learning.
- Knowledge in optimization theory, including Convex optimization theory and gradient based optimization.
- Direct or indirect experience in OPC (Optical Proximity Correction), including rigorous lithography simulation (Hyperlith, Prolith), RET, and advanced mask technology.
- Knowledge in EUV lithography and challenges.
Responsibilities
- Feasibility study of advanced imaging for ASML scanner application, including study the imaging impact with illumination, mask correction, aberration, overlay and mirror/lens heating.
- Design software component to support customer’s request on process window enhancement and process window control for ASML scanner application
- Perform qualification test, lead wafer validation and generate proof data, provide training slides, user guide and other technical documents.
- Work with local application engineer to support customer activity, promoting ASML scanner and application adoption.
Other
- Pursuing PhD., or Master’s degree in Optics, EE/ME, Physic with experience in optical design, lithography, semiconductor/EDA industry
- Strong English communication skills – both written and oral, ability to influence, etc.
- Ability to work with local application engineer to support customer activity
- Travel requirements not specified
- ASML provides reasonable accommodations to applicants for ASML employment and ASML employees with disabilities.